Ionized physical vapor deposition (IPVD): A review of technology and applications

Overview of attention for article published in Thin Solid Films, August 2006

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In the top 25% of all research outputs scored by Altmetric
Among the highest-scoring outputs from this source (#11 of 6,135)
High Attention Score compared to outputs of the same age (95th percentile)
High Attention Score compared to outputs of the same age and source (98th percentile)

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patent: 58 patents

wikipedia: 2 Wikipedia pages

Citations

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mendeley: 652 Mendeley
citeulike: 1 CiteULike

Summary Patents Wikipedia Dimensions citations

So far, Altmetric has seen 58 patents that reference this research output.

VACUUM LAYER DEPOSITION APPARATUS AND METHOD OF DEPOSITING A LAYER ON A SUBSTRATE…

Application WO-2023156117-A1

World Intellectual Property Organisation (WIPO)

Nanowires and process for their production

Grant US-11351602-B2

United States of America

HARD CARBON COATINGS WITH IMPROVED ADHESION STRENGTH BY MEANS OF HIPIMS AND METHOD THEREOF

Application WO-2022073631-A1

World Intellectual Property Organisation (WIPO)

Thin film coating and method of fabrication thereof

Grant US-11274360-B2

United States of America

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