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Subsecond Annealing of Advanced Materials

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Cover of 'Subsecond Annealing of Advanced Materials'

Table of Contents

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    Book Overview
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    Chapter 1 Historical Aspects of Subsecond Thermal Processing
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    Chapter 2 Nanonet Formation by Constitutional Supercooling of Pulsed Laser Annealed, Mn-Implanted Germanium
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    Chapter 3 Metastable Activation of Dopants by Solid Phase Epitaxial Recrystallisation
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    Chapter 4 Superconducting Gallium Implanted Germanium
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    Chapter 5 Structural Changes in SiGe/Si Layers Induced by Fast Crystallization
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    Chapter 6 Sub-nanosecond Thermal Spike Induced Nanostructuring of Thin Solid Films Under Swift Heavy Ion (SHI) Irradiation
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    Chapter 7 Pulsed-Laser-Induced Epitaxial Growth of Silicon for Three-Dimensional Integrated Circuits
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    Chapter 8 Improvement of Performance and Cost of Functional Films Using Large Area Laser RTP
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    Chapter 9 Pulsed Laser Dopant Activation for Semiconductors and Solar Cells
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    Chapter 10 Formation of High-Quality μm-Order-Thick Poly-Si Films on Glass-Substrates by Flash Lamp Annealing
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    Chapter 11 Millisecond-Range Liquid-Phase Processing of Silicon-Based Hetero-nanostructures
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    Chapter 12 Radiation Thermometry—Sources of Uncertainty During Contactless Temperature Measurement
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    Chapter 13 Millisecond Annealing for Semiconductor Device Applications
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    Chapter 14 Low-Cost and Large-Area Electronics, Roll-to-Roll Processing and Beyond
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    Chapter 15 Application of Sub-second Annealing for Diluted Ferromagnetic Semiconductors
Overall attention for this book and its chapters
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About this Attention Score

  • In the top 25% of all research outputs scored by Altmetric
  • High Attention Score compared to outputs of the same age (82nd percentile)
  • High Attention Score compared to outputs of the same age and source (87th percentile)

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