Fast patterning microstructures using inkjet printing conformal masks

Overview of attention for article published in Microsystem Technologies, February 2008

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In the top 25% of all research outputs scored by Altmetric
Among the highest-scoring outputs from this source (#13 of 596)
High Attention Score compared to outputs of the same age (88th percentile)
High Attention Score compared to outputs of the same age and source (87th percentile)

Mentioned by

patent: 4 patents

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mendeley: 10 Mendeley

Summary Patents

So far, Altmetric has seen 4 patents that reference this research output.

Cooking vessel and method for manufacturing the same

Application US-10244882-B2

United States of America

Process for producing a photomask on a photopolymeric surface

Grant US-9513551-B2

United States of America

Process for producing a photomask on a photopolymeric surface

Application EP-2562599-A3

European Patent Office

PROCESS FOR PRODUCING A PHOTOMASK ON A PHOTOPOLYMERIC SURFACE

Application WO-2010086850-A3

World Intellectual Property Organisation (WIPO)

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