MELT INFILTRATION WITH SIGA AND/OR SIIN ALLOYS Application EP-3568382-A4 European Patent Office 26 Aug 2020
Melt infiltration with SiGa and/or siln alloys Application US-10196315-B2 United States of America 05 Feb 2019
Methods for fabricating self-aligning semiconductor hetereostructures using nanowires Grant US-9406823-B2 United States of America 02 Aug 2016
Methods for fabricating high aspect ratio probes and deforming high aspect ratio… Grant US-9390936-B2 United States of America 12 Jul 2016