Controlling the B/Ti ratio of TiBx thin films grown by high-power impulse magnetron sputtering

Overview of attention for article published in Journal of Vacuum Science & Technology: Part B, April 2018

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AVS #JVSTA - Stoichiometric HiPIMS TiB2 is obtained at shorter pulse lengths so film growth is controlled by ions, not neutrals. https://t.co/KMlDSEQtLT

18 May 2018

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