Direct patterning of self assembled nano-structures of block copolymers via electron beam lithography

Overview of attention for article published in Macromolecular Research, October 2005

Altmetric Badge

Mentioned by

patent: 1 patent

Citations

dimensions_citation: 12 Dimensions

Readers on

mendeley: 8 Mendeley

Summary Patents Dimensions citations

So far, Altmetric has seen 1 patent that references this research output.

Thin films organized in nanodomains on the basis of copolymers having polysaccharide…

Grant US-9377684-B2

United States of America

This page shows the most recent patents that mention this research output.

Click here to find out how to access more activity.