Achieving nanoscale horizontal separations in the standard 2 μm PolyMUMPS process

Overview of attention for article published in Applied Nanoscience, January 2013

Altmetric Badge

About this Attention Score

Among the highest-scoring outputs from this source (#36 of 180)
Average Attention Score compared to outputs of the same age

Mentioned by

patent: 1 patent

Readers on

mendeley: 2 Mendeley

Summary Patents

So far, Altmetric has seen 1 patent that references this research output.

Capacitive measurements of divots in semiconductor devices

Grant US-9941179-B2

United States of America

This page shows the most recent patents that mention this research output.

Click here to find out how to access more activity.