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Mendeley readers
| Chapter title |
Simulation of the Sputtering Process
|
|---|---|
| Chapter number | 1 |
| Book title |
Reactive Sputter Deposition
|
| Published by |
Springer, Berlin, Heidelberg, January 2008
|
| DOI | 10.1007/978-3-540-76664-3_1 |
| Book ISBNs |
978-3-54-076662-9, 978-3-54-076664-3
|
| Authors |
Tadayoshi Ono, Takahiro Kenmotsu, Tetsuya Muramoto |
Mendeley readers
The data shown below were compiled from readership statistics for 78 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Belgium | 2 | 3% |
| Germany | 1 | 1% |
| Colombia | 1 | 1% |
| Norway | 1 | 1% |
| Netherlands | 1 | 1% |
| Unknown | 72 | 92% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Student > Ph. D. Student | 19 | 24% |
| Researcher | 12 | 15% |
| Student > Master | 11 | 14% |
| Student > Bachelor | 8 | 10% |
| Student > Doctoral Student | 6 | 8% |
| Other | 14 | 18% |
| Unknown | 8 | 10% |
| Readers by discipline | Count | As % |
|---|---|---|
| Materials Science | 29 | 37% |
| Physics and Astronomy | 16 | 21% |
| Engineering | 13 | 17% |
| Chemistry | 2 | 3% |
| Chemical Engineering | 1 | 1% |
| Other | 3 | 4% |
| Unknown | 14 | 18% |