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Mendeley readers
| Chapter title |
CMP Cleaning
|
|---|---|
| Chapter number | 8 |
| Book title |
Chemical-Mechanical Planarization of Semiconductor Materials
|
| Published in |
Springer Series in Materials Science, January 2004
|
| DOI | 10.1007/978-3-662-06234-0_8 |
| Book ISBNs |
978-3-64-207738-8, 978-3-66-206234-0
|
| Authors |
John de Larios, de Larios, John |
Mendeley readers
The data shown below were compiled from readership statistics for 4 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
| Country | Count | As % |
|---|---|---|
| Unknown | 4 | 100% |
Demographic breakdown
| Readers by professional status | Count | As % |
|---|---|---|
| Student > Ph. D. Student | 1 | 25% |
| Professor > Associate Professor | 1 | 25% |
| Student > Bachelor | 1 | 25% |
| Student > Master | 1 | 25% |
| Readers by discipline | Count | As % |
|---|---|---|
| Engineering | 2 | 50% |
| Chemistry | 1 | 25% |
| Materials Science | 1 | 25% |