You are seeing a free-to-access but limited selection of the activity Altmetric has collected about this research output.
Click here to find out more.
Mendeley readers
Chapter title |
Deposition of SiO 2 Thin Films by Remote Plasma Enhanced Chemical Vapor Deposition (Remote PECVD)
|
---|---|
Chapter number | 13 |
Book title |
The Physics and Chemistry of SiO 2 and the Si-SiO 2 Interface
|
Published by |
Springer, Boston, MA, January 1988
|
DOI | 10.1007/978-1-4899-0774-5_13 |
Book ISBNs |
978-1-4899-0776-9, 978-1-4899-0774-5
|
Authors |
D. V. Tsu, S. S. Kim, G. Lucovsky |
Mendeley readers
The data shown below were compiled from readership statistics for 2 Mendeley readers of this research output. Click here to see the associated Mendeley record.
Geographical breakdown
Country | Count | As % |
---|---|---|
Unknown | 2 | 100% |
Demographic breakdown
Readers by professional status | Count | As % |
---|---|---|
Researcher | 2 | 100% |
Readers by discipline | Count | As % |
---|---|---|
Materials Science | 2 | 100% |