Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using nitrous oxide as a single-source precursor

Overview of attention for article published in Journal of Vacuum Science & Technology: Part B, July 2015

Altmetric Badge

Mentioned by

twitter: 1 X user

Citations

dimensions_citation: 19 Dimensions

Readers on

mendeley: 27 Mendeley

Summary X Dimensions citations

So far, Altmetric has seen 1 X post from an account with 2,911 followers.

Silicon oxynitride films deposited by reactive high power impulse magnetron sputtering using ... http://t.co/hbeKZlcVjC #coatings #jvsta

Reply Repost Favourite

This page shows the most recent X posts that mention this research output.

Click here to find out how to access more activity.