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CMP – Chemical-Mechanical Polishing
Encyclopedia of Tribology
Springer US, January 2013
Q. Jane Wang, Yip-Wah Chung
The data shown below were compiled from readership statistics for 3 Mendeley readers of this research output. Click here to see the associated Mendeley record.
|Readers by professional status||Count||As %|
|Readers by discipline||Count||As %|
|Physics and Astronomy||1||33%|